| 1968 | Launched Covalent Materials Co., Ltd. (formerly Toshiba Ceramics Co., Ltd.). |
|---|---|
| 1977 | Transferred the silicon wafer business from Toshiba Corporation. |
| 1982 | Launched Tokuyama Factory (formerly Tokuyama Ceramics Co., Ltd.). |
| 1983 | Started production of epitaxial wafers (formerly Tokuyama Ceramics Co., Ltd.). |
| 1985 | Launched Sekikawa Factory (formerly Sekikawa Denshi Co., Ltd.). |
| 1986 | Started production of diffusion wafers (former Sekikawa Denshi Co., Ltd.). |
| 1991 | Established our company (formerly Niigata Toshiba Ceramics Co., Ltd.). |
| 1993 | Started production of 150 mm wafers |
| 1995 | Started production of 200 mm wafers |
| 2001 | Started production of 300 mm wafers |
| 2011 | Consolidated the silicon wafer business of Covalent Materials into our Company |
| 2012 | Transferred our stock to the Sino-American Silicon Products Inc. Group |
| 2013 | Changed the company name to GlobalWafers Japan Co., Ltd. |
| 2017 | Acquired MEMC Japan share |
